Characterization of Extreme Ultraviolet Imaging Systems - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Characterization of Extreme Ultraviolet Imaging Systems write by Edita Tejnil. This book was released on 1997. Characterization of Extreme Ultraviolet Imaging Systems available in PDF, EPUB and Kindle.
Extreme Ultraviolet Imaging and Resist Characterization Using Spatial Filtering Techniques
Extreme Ultraviolet Imaging and Resist Characterization Using Spatial Filtering Techniques - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Extreme Ultraviolet Imaging and Resist Characterization Using Spatial Filtering Techniques write by Michael David Shumway. This book was released on 2004. Extreme Ultraviolet Imaging and Resist Characterization Using Spatial Filtering Techniques available in PDF, EPUB and Kindle.
Characterization of an Expanded-field Schwarzschild Objective for Extreme Ultraviolet Lithography
Characterization of an Expanded-field Schwarzschild Objective for Extreme Ultraviolet Lithography - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Characterization of an Expanded-field Schwarzschild Objective for Extreme Ultraviolet Lithography write by . This book was released on 1994. Characterization of an Expanded-field Schwarzschild Objective for Extreme Ultraviolet Lithography available in PDF, EPUB and Kindle. The performance of a new 10x-reduction Schwarzschild system for projection imaging at 13.4 nm wavelength is reported. The optical design is optimized to achieve 0.1 [mu]m resolution over a 0.4 mm image field of view, an increase in area of a factor of 100 over previous designs. An off-set aperture, located on the convex primary, defines an unobscured 0.08 numerical aperture. The system is illuminated using extreme ultraviolet (EUV) radiation emitted from a laser plasma source and collected by an ellipsoidal condenser. A 450 turning mirror is used to relay the collected EUV radiation onto a near-normal reflecting mask. Multiple sets of primary and secondary elements were fabricated, matched and clocked to minimize the effects of small figure errors on imaging performance. Optical metrology indicates that the wave-front error within the subaperture used is within a factor of two of the design value. Images recorded in PMMA and ZEP 520 resists reveal good imaging fidelity over much of the 0.4 mm field with equal line/space gratings being resolved to 0.1 [mu]m.
At-wavelength Characterization of the Extreme Ultraviolet Engineering Test Stand Set-2 Optic
At-wavelength Characterization of the Extreme Ultraviolet Engineering Test Stand Set-2 Optic - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook At-wavelength Characterization of the Extreme Ultraviolet Engineering Test Stand Set-2 Optic write by . This book was released on 2001. At-wavelength Characterization of the Extreme Ultraviolet Engineering Test Stand Set-2 Optic available in PDF, EPUB and Kindle. At-wavelength interferometric characterization of a new 4x-reduction lithographic-quality extreme ultraviolet (EUV) optical system is described. This state-of-the-art projection optic was fabricated for installation in the EUV lithography Engineering Test Stand (ETS) and is referred to as the ETS Set-2 optic. EUV characterization of the Set-2 optic is performed using the EUV phase-shifting point diffraction interferometer (PS/PDI) installed on an undulator beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. This is the same interferometer previously used for the at-wavelength characterization and alignment of the ETS Set-1 optic. In addition to the PS/PDI-based full-field wavefront characterization, we also present wavefront measurements performed with lateral shearing interferometry, the chromatic dependence of the wavefront error, and the system-level pupil-dependent spectral-bandpass characteristics of the optic; the latter two properties are only measurable using at-wavelength interferometry.
Extreme Ultraviolet Reflectometry for Structural and Optical Characterization of Thin Films and Layer Systems
Extreme Ultraviolet Reflectometry for Structural and Optical Characterization of Thin Films and Layer Systems - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Extreme Ultraviolet Reflectometry for Structural and Optical Characterization of Thin Films and Layer Systems write by Maksym Tryus. This book was released on 2018. Extreme Ultraviolet Reflectometry for Structural and Optical Characterization of Thin Films and Layer Systems available in PDF, EPUB and Kindle.
