Crystalline Oxide: Volume 747 - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Crystalline Oxide: Volume 747 write by D. G. Schlom. This book was released on 2003-06-23. Crystalline Oxide: Volume 747 available in PDF, EPUB and Kindle. This book contains the proceedings of two symposia held at the 2002 MRS Fall Meeting in Boston. Papers from Symposium T, Crystalline Oxides on Semiconductors, bring together experts from different technology areas - high-k gate dielectrics, novel memories, and ferroelectrics, for example - to examine commonality among the fields. These papers offer an overview of the field, highlight interesting experimental results and device ideas, and feature innovative theoretical approaches to understanding these systems. Symposium V, Interfacial Issues for Oxide-Based Electronics, covers a wide range of topics involving the interfaces between electro-optical oxide layers and other materials. Overall, it is clear that a new generation of materials and heterostructures has been enabled by the increasing control of interfacial phenomena. Topics include: epitaxial oxide-silicon heterostructures; ferroelectric thin films on silicon; theory and modeling; crystalline oxides for gate dielectrics; transparent conducting oxides; transparent conducting oxides and oxide growth and properties; field effect devices and gate dielectrics; ferroelectrics, capacitors and sensors; organic devices and interfacial growth issues.
Solid-State Ionics - 2002: Volume 756
Solid-State Ionics - 2002: Volume 756 - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Solid-State Ionics - 2002: Volume 756 write by Philippe Knauth. This book was released on 2003-04-17. Solid-State Ionics - 2002: Volume 756 available in PDF, EPUB and Kindle. The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Solid-State Chemistry of Inorganic Materials IV: Volume 755
Solid-State Chemistry of Inorganic Materials IV: Volume 755 - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Solid-State Chemistry of Inorganic Materials IV: Volume 755 write by M. Á. Alario-Franco. This book was released on 2003-08-14. Solid-State Chemistry of Inorganic Materials IV: Volume 755 available in PDF, EPUB and Kindle. Since its inception in the mid-twentieth century, solid-state chemistry has matured within the chemical sciences. In the same way that chemistry itself is considered a central science, solid-state chemistry is central in its many relations to physics, in particular to solid-state physics and also to materials science and engineering. There are few problems in materials science or engineering in which the preparation of the material itself is not a central issue and, more often than not, this will be a solid-state chemical problem. For these reasons, it is not surprising that in the technological development of the last century, solid-state chemistry has grown in importance. It is not only a synthesis science, it is also the science of structures, defects, stoichiometry, and physical chemical properties. Most of these are explored in the book. Topics include: metal-to-insulator transition; porous materials; dielectric materials; nanomaterials; synthesis of materials; films and catalytic materials; CMR materials; thermoelectric materials; dielectrics, catalysts, phosphors, films and properties and synthesis and crystal growth.
GaN and Related Alloys - 2002: Volume 743
GaN and Related Alloys - 2002: Volume 743 - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook GaN and Related Alloys - 2002: Volume 743 write by Materials Research Society. Meeting. This book was released on 2003-06-02. GaN and Related Alloys - 2002: Volume 743 available in PDF, EPUB and Kindle. This year's nitride symposium showed the scope of nitride-related advances spanning basic materials physics over process technology to high-performance devices. Progress was reported in bulk growth of GaN and AlN, growth on various substrates and substrate orientations, optical properties of InN, defect and doping analysis of p-doped GaN, and polarization properties. These led to new performance records in visible light emitter technology, i.e., higher efficiency/higher brightness, UV emitters with shorter wavelength, and UV and photo detectors. Advances in the development of nitride-based electronic devices with new heterostructure FET designs for RF power applications, including those on Si substrates and wafer fusion, are also reported. This book captures the exciting developments in this rapidly progressing field. Topics include: epitaxy - devices and defect reduction; defects and characterization; epitaxy - nonpolar orientations and alloys; optical properties; UV emitters and detectors; visible light emitters; electronic devices; characterization of defects and transport; and contacts, processing and p-type nitrides.
Novel Materials and Processes for Advanced CMOS: Volume 745
Novel Materials and Processes for Advanced CMOS: Volume 745 - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Novel Materials and Processes for Advanced CMOS: Volume 745 write by Mark I. Gardner. This book was released on 2003-03-25. Novel Materials and Processes for Advanced CMOS: Volume 745 available in PDF, EPUB and Kindle. Progress in MOS integrated-circuit technology is largely driven by the ability to dimensionally scale the constituent components of individual devices and their associated interconnections. Given a set of materials with fixed properties, this scaling is finite and its predicted limits are rapidly approaching. The International Technology Roadmap for Semiconductors establishes the pace at which this scaling occurs and identifies many of the technological challenges ahead. This volume assembles representatives from the fields of materials science, physics, electrical and chemical engineering to provide an insightful review of current technology and understanding. Specifically, the intent is to discuss materials issues stemming from device scaling to sub-100nm technology nodes. Topics include: high-k characterization; atomic layer deposition; gate metal materials and integration; contacts and ultrashallow junction formation; theory and modeling and crystalline oxides for gate dielectrics.
