Experimental Investigation of Beryllium-based Multilayer Coatings for Extreme Ultraviolet Lithography - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Experimental Investigation of Beryllium-based Multilayer Coatings for Extreme Ultraviolet Lithography write by . This book was released on 1999. Experimental Investigation of Beryllium-based Multilayer Coatings for Extreme Ultraviolet Lithography available in PDF, EPUB and Kindle. The performance of beryllium-based multilayer coatings designed to reflect light of wavelengths near 11 nm, at normal incidence, is presented. These multilayer coatings are of special interest for extreme ultraviolet lithography (EUVL). The beryllium-based multilayers investigated were Mo/Be, Ru/Be and a new material combination Mo, CiBe. The highest reflectivity achieved so far is 70% at 11.3 mn with 70 bilayers of Mo/Be. However, even though high reflectivity is very important, there are other parameters to satisfy the requirements for an EUVL production tool. Multilayer stress, thermal stability, radiation stability and long term reflectance stability are of equal or greater importance. An experimental characterization of several coatings was carried out to determine the reflectivity, stress, microstructure, and long term stability of these coatings. Theoretically calculated reflectivities are compared with experimental results for different material pairs; differences between experimental and theoretical reflectivities and bandwidths are addressed. Keywords: Extreme ultraviolet (EUV) lithography, reflective coatings, multilayer deposition, beryllium.
EUV Lithography
EUV Lithography - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook EUV Lithography write by Vivek Bakshi. This book was released on 2009. EUV Lithography available in PDF, EPUB and Kindle. Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
X-Ray Spectrometry
X-Ray Spectrometry - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook X-Ray Spectrometry write by Kouichi Tsuji. This book was released on 2005-08-19. X-Ray Spectrometry available in PDF, EPUB and Kindle. X-Ray Spectrometry: Recent Technological Advances covers the latest developments and areas of research in the methodological and instrumental aspects of x-ray spectrometry. Includes the most advanced and high-tech aspects of the chemical analysis techniques based on x-rays Introduces new types of X-ray optics and X-ray detectors, covering history, principles, characteristics and future trends Written by internationally recognized scientists, all of whom are eminent specialists in each of the sub-fields Sections include: X-Ray Sources, X-Ray Optics, X-Ray Detectors, Special Configurations, New Computerization Methods, New Applications This valuable book will assist all analytical chemists and other users of x-ray spectrometry to fully exploit the capabilities of this set of powerful analytical tools and to further expand applications in such fields as material and environmental sciences, medicine, toxicology, forensics, archaeometry and many others.
Beryllium Based Multilayers for Normal Incidence Extreme Ultraviolet Reflectivity
Beryllium Based Multilayers for Normal Incidence Extreme Ultraviolet Reflectivity - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Beryllium Based Multilayers for Normal Incidence Extreme Ultraviolet Reflectivity write by . This book was released on 1994. Beryllium Based Multilayers for Normal Incidence Extreme Ultraviolet Reflectivity available in PDF, EPUB and Kindle. The need for normal incidence mirrors maintaining reflectivity greater than 60% for an industrially competitive Extreme Ultraviolet Lithography (EUV) system has been well documented. The Molybdenum/Silicon system has emerged as the de-facto standard, where researchers are now routinely fabricating mirrors demonstrating 63% reflectivity near 130 Angstroms. However, multilayer mirrors using beryllium as the low atomic number (low-Z) spacer could potentially show similar or better reflectivity, and operate at wavelengths down to the beryllium K-edge at 111 Angstroms. Besides offering potentially greater reflectivity, the shorter wavelength light offers increased dissolution depth in photoresists, and offers potentially better resolution and depth of focus. We will report our latest results from beryllium based multilayers. The mirrors were fabricated at the Lawrence Livermore National Laboratory (LLNL) and tested at the Center for X-Ray Optics at Lawrence Berkeley Laboratory (CXRO/LBL).
Optical Engineering
Optical Engineering - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Optical Engineering write by . This book was released on 2001. Optical Engineering available in PDF, EPUB and Kindle. Publishes papers reporting on research and development in optical science and engineering and the practical applications of known optical science, engineering, and technology.
