Extreme Ultraviolet Reflectometry for Structural and Optical Characterization of Thin Films and Layer Systems - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Extreme Ultraviolet Reflectometry for Structural and Optical Characterization of Thin Films and Layer Systems write by Maksym Tryus. This book was released on 2018. Extreme Ultraviolet Reflectometry for Structural and Optical Characterization of Thin Films and Layer Systems available in PDF, EPUB and Kindle.
High-precision Reflectometry of Multilayer Coatings for Extreme Ultraviolet Lithography
High-precision Reflectometry of Multilayer Coatings for Extreme Ultraviolet Lithography - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook High-precision Reflectometry of Multilayer Coatings for Extreme Ultraviolet Lithography write by . This book was released on 1999. High-precision Reflectometry of Multilayer Coatings for Extreme Ultraviolet Lithography available in PDF, EPUB and Kindle. Synchrotron-based reflectometry is an important technique for the precise determination of optical properties of reflective multilayer coatings for Extreme Ultraviolet Lithography (EUVL). Multilayer coatings enable normal incidence reflectances of more than 65% in the wavelength range between 11 and 15 nm. In order to achieve high resolution and throughput of EUVL systems, stringent requirements not only apply to their mechanical and optical layout, but also apply to the optical properties of the multilayer coatings. Therefore, multilayer deposition on near-normal incidence optical surfaces of projection optics, condenser optics and reflective masks requires suitable high-precision metrology. Most important, due to their small bandpass on the order of only 0.5 nm, all reflective multilayer coatings in EUVL systems must be wavelength-matched to within "0.05 nm. In some cases, a gradient of the coating thickness is necessary for wavelength matching at variable average angle of incidence in different locations on the optical surfaces. Furthermore, in order to preserve the geometrical figure of the optical substrates, reflective multilayer coatings need to be uniform to within 0.01 nm in their center wavelength. This requirement can only be fulfilled with suitable metrology, which provides a precision of a fraction of this value. In addition, for the detailed understanding and the further development of reflective multilayer coatings a precision in the determination of peak reflectances is desirable on the order of 0.1%. Substrates up to 200 mm in diameter and 15 kg in mass need to be accommodated. Above requirements are fulfilled at beamline 6.3.2 of the Advanced Light Source (ALS) in Berkeley. This beamline proved to be precise within 0.2% (ms) for reflectance and 0.002 nm (rms) for wavelength.
Guide to NIST (National Institute of Standards and Technology)
Guide to NIST (National Institute of Standards and Technology) - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Guide to NIST (National Institute of Standards and Technology) write by DIANE Publishing Company. This book was released on 1997-07. Guide to NIST (National Institute of Standards and Technology) available in PDF, EPUB and Kindle. Gathers in one place descriptions of NIST's many programs, products, services, and research projects, along with contact names, phone numbers, and e-mail and World Wide Web addresses for further information. It is divided into chapters covering each of NIST's major operating units. In addition, each chapter on laboratory programs includes subheadings for NIST organizational division or subject areas. Covers: electronics and electrical engineering; manufacturing engineering; chemical science and technology; physics; materials science and engineering; building and fire research and information technology.
Surface and Thin Film Analysis by Spectroscopic Reflectometry with Extreme Ultraviolet Emitting Laboratory Sources
Surface and Thin Film Analysis by Spectroscopic Reflectometry with Extreme Ultraviolet Emitting Laboratory Sources - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Surface and Thin Film Analysis by Spectroscopic Reflectometry with Extreme Ultraviolet Emitting Laboratory Sources write by Matus Banyay. This book was released on 2011. Surface and Thin Film Analysis by Spectroscopic Reflectometry with Extreme Ultraviolet Emitting Laboratory Sources available in PDF, EPUB and Kindle.
Atomic Layer Deposition
Atomic Layer Deposition - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Atomic Layer Deposition write by David Cameron. This book was released on 2020-12-28. Atomic Layer Deposition available in PDF, EPUB and Kindle. Atomic layer deposition (ALD) is a thin film deposition process renowned for its ability to produce layers with unrivaled control of thickness and composition, conformability to extreme three-dimensional structures, and versatility in the materials it can produce. These range from multi-component compounds to elemental metals and structures with compositions that can be adjusted over the thickness of the film. It has expanded from a small-scale batch process to large scale production, also including continuous processing – known as spatial ALD. It has matured into an industrial technology essential for many areas of materials science and engineering from microelectronics to corrosion protection. Its attributes make it a key technology in studying new materials and structures over an enormous range of applications. This Special Issue contains six research articles and one review article that illustrate the breadth of these applications from energy storage in batteries or supercapacitors to catalysis via x-ray, UV, and visible optics.
