High-k Gate Dielectrics for CMOS Technology - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook High-k Gate Dielectrics for CMOS Technology write by Gang He. This book was released on 2012-08-10. High-k Gate Dielectrics for CMOS Technology available in PDF, EPUB and Kindle. A state-of-the-art overview of high-k dielectric materials for advanced field-effect transistors, from both a fundamental and a technological viewpoint, summarizing the latest research results and development solutions. As such, the book clearly discusses the advantages of these materials over conventional materials and also addresses the issues that accompany their integration into existing production technologies. Aimed at academia and industry alike, this monograph combines introductory parts for newcomers to the field as well as advanced sections with directly applicable solutions for experienced researchers and developers in materials science, physics and electrical engineering.
High Permittivity Gate Dielectric Materials
High Permittivity Gate Dielectric Materials - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook High Permittivity Gate Dielectric Materials write by Samares Kar. This book was released on 2013-06-25. High Permittivity Gate Dielectric Materials available in PDF, EPUB and Kindle. "The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .
High Dielectric Constant Materials
High Dielectric Constant Materials - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook High Dielectric Constant Materials write by Howard Huff. This book was released on 2005. High Dielectric Constant Materials available in PDF, EPUB and Kindle. Issues relating to the high-K gate dielectric are among the greatest challenges for the evolving International Technology Roadmap for Semiconductors (ITRS). More than just an historical overview, this book will assess previous and present approaches related to scaling the gate dielectric and their impact, along with the creative directions and forthcoming challenges that will define the future of gate dielectric scaling technology. Topics include: an extensive review of Moore's Law, the classical regime for SiO2 gate dielectrics; the transition to silicon oxynitride gate dielectrics; the transition to high-K gate dielectrics (including the drive towards equivalent oxide thickness in the single-digit nanometer regime); and future directions and issues for ultimate technology generation scaling. The vision, wisdom, and experience of the team of authors will make this book a timely, relevant, and interesting, resource focusing on fundamentals of the 45 nm Technology Generation and beyond.
High k Gate Dielectrics
High k Gate Dielectrics - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook High k Gate Dielectrics write by Michel Houssa. This book was released on 2003-12-01. High k Gate Dielectrics available in PDF, EPUB and Kindle. The drive toward smaller and smaller electronic componentry has huge implications for the materials currently being used. As quantum mechanical effects begin to dominate, conventional materials will be unable to function at scales much smaller than those in current use. For this reason, new materials with higher electrical permittivity will be requ
High-k Gate Dielectric Materials
High-k Gate Dielectric Materials - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook High-k Gate Dielectric Materials write by Niladri Pratap Maity. This book was released on 2020-12-18. High-k Gate Dielectric Materials available in PDF, EPUB and Kindle. This volume explores and addresses the challenges of high-k gate dielectric materials, one of the major concerns in the evolving semiconductor industry and the International Technology Roadmap for Semiconductors (ITRS). The application of high-k gate dielectric materials is a promising strategy that allows further miniaturization of microelectronic components. This book presents a broad review of SiO2 materials, including a brief historical note of Moore’s law, followed by reliability issues of the SiO2 based MOS transistor. It goes on to discuss the transition of gate dielectrics with an EOT ~ 1 nm and a selection of high-k materials. A review of the various deposition techniques of different high-k films is also discussed. High-k dielectrics theories (quantum tunneling effects and interface engineering theory) and applications of different novel MOSFET structures, like tunneling FET, are also covered in this book. The volume also looks at the important issues in the future of CMOS technology and presents an analysis of interface charge densities with the high-k material tantalum pentoxide. The issue of CMOS VLSI technology with the high-k gate dielectric materials is covered as is the advanced MOSFET structure, with its working structure and modeling. This timely volume will prove to be a valuable resource on both the fundamentals and the successful integration of high-k dielectric materials in future IC technology.
