Metrology of 13-nm Optics for Extreme Ultraviolet Lithography - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Metrology of 13-nm Optics for Extreme Ultraviolet Lithography write by . This book was released on 1997. Metrology of 13-nm Optics for Extreme Ultraviolet Lithography available in PDF, EPUB and Kindle. This report documents activities carried in support of the design and construction of an ultra-high precision measuring machine intended for the support of Extreme Ultraviolet Lithography development (for semiconductor fabrication). At the outset, this project was aimed at the overall fabrication of such a measuring machine. Shortly after initiation, however, the scope of activities was reduced and effort was concentrated on the key technical advances necessary to support such machine development: high accuracy surface sensing and highly linear distance interferometry.
Development of a Discharge Pumped 13 Nm Laser for Metrology of Projection Lithography Optics at the Manufacture-Site
Development of a Discharge Pumped 13 Nm Laser for Metrology of Projection Lithography Optics at the Manufacture-Site - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Development of a Discharge Pumped 13 Nm Laser for Metrology of Projection Lithography Optics at the Manufacture-Site write by . This book was released on 2003. Development of a Discharge Pumped 13 Nm Laser for Metrology of Projection Lithography Optics at the Manufacture-Site available in PDF, EPUB and Kindle. A high power capillary discharge cadmium plasma source was developed to investigate the generation of 13.2 nm coherent radiation for metrology tasks in Extreme Ultraviolet Lithography. Excitation of a capillary channel filled with Cd vapor with a fast current pulse (190 kA, 15 ns risetime) resulted in the successful excitation of 13.2 nm radiation from the 4d ISO-4p 1P1 laser line of Nickel-like Cd (Cd XXI). Spectra of this capillary discharge plasma showed the emission from the 13.2nm laser line is the most intense in that spectral region. Detailed spectroscopic studies confirmed that the observed 13.2 nm line radiation corresponds to the Cd XXI laser line, and identified fifty-five Cd XXI lines in the 12.7-18.4 nm region which constitute a valuable diagnostics to optimize the gain in the 13.2 nm laser line using line intensity ratio techniques. The dynamics and symmetry of the capillary discharge Cd plasma column were also studied using an EUV pinhole camera . The pinhole images show that the plasma column presents a good degree of symmetry up to the time of maximum compression.
Phase Shifting Diffraction Interferometry for Measuring Extreme Ultraviolet Optics
Phase Shifting Diffraction Interferometry for Measuring Extreme Ultraviolet Optics - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Phase Shifting Diffraction Interferometry for Measuring Extreme Ultraviolet Optics write by . This book was released on 1996. Phase Shifting Diffraction Interferometry for Measuring Extreme Ultraviolet Optics available in PDF, EPUB and Kindle. Extreme ultraviolet projection lithography operating at a wavelength of 13nm requires surface figure accuracy on each mirror to be better than 0.25nm rms. A new type of interferometry, based on the fundamental process of diffraction, is described that can intrinsically achieve the required accuracy. Applying this principle, two independent spherical wavefronts are generated - one serves as the measurement wavefront and is incident on the optic or optical system under test and the other serves as the reference wavefront. Since they are generated independently their relative amplitude and phase can be controlled, providing contrast adjustment and phase shifting capability. Using diffraction from a single mode optical fiber, different interferometers can be configured to measure individual mirrors or entire imaging systems. Measurement of an EUV projection system is described. 5 refs., 4 figs.
EUV Lithography
EUV Lithography - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook EUV Lithography write by Vivek Bakshi. This book was released on 2009. EUV Lithography available in PDF, EPUB and Kindle. Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Scientific and Technical Aerospace Reports
Scientific and Technical Aerospace Reports - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Scientific and Technical Aerospace Reports write by . This book was released on 1995. Scientific and Technical Aerospace Reports available in PDF, EPUB and Kindle. Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
