Nanoscale Silicon Devices - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Nanoscale Silicon Devices write by Shunri Oda. This book was released on 2018-09-03. Nanoscale Silicon Devices available in PDF, EPUB and Kindle. Is Bigger Always Better? Explore the Behavior of Very Small Devices as Described by Quantum Mechanics Smaller is better when it comes to the semiconductor transistor. Nanoscale Silicon Devices examines the growth of semiconductor device miniaturization and related advances in material, device, circuit, and system design, and highlights the use of device scaling within the semiconductor industry. Device scaling, the practice of continuously scaling down the size of metal-oxide-semiconductor field-effect transistors (MOSFETs), has significantly improved the performance of small computers, mobile phones, and similar devices. The practice has resulted in smaller delay time and higher device density in a chip without an increase in power consumption. This book covers recent advancements and considers the future prospects of nanoscale silicon (Si) devices. It provides an introduction to new concepts (including variability in scaled MOSFETs, thermal effects, spintronics-based nonvolatile computing systems, spin-based qubits, magnetoelectric devices, NEMS devices, tunnel FETs, dopant engineering, and single-electron transfer), new materials (such as high-k dielectrics and germanium), and new device structures in three dimensions. It covers the fundamentals of such devices, describes the physics and modeling of these devices, and advocates further device scaling and minimization of energy consumption in future large-scale integrated circuits (VLSI). Additional coverage includes: Physics of nm scaled devices in terms of quantum mechanics Advanced 3D transistors: tri-gate structure and thermal effects Variability in scaled MOSFET Spintronics on Si platform NEMS devices for switching, memory, and sensor applications The concept of ballistic transport The present status of the transistor variability and more An indispensable resource, Nanoscale Silicon Devices serves device engineers and academic researchers (including graduate students) in the fields of electron devices, solid-state physics, and nanotechnology.
Simulation of Nanoscale Silicon Devices with Combined Monte Carlo/quantum Approaches
Simulation of Nanoscale Silicon Devices with Combined Monte Carlo/quantum Approaches - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Simulation of Nanoscale Silicon Devices with Combined Monte Carlo/quantum Approaches write by Ranganathan Ravishankar. This book was released on 2006. Simulation of Nanoscale Silicon Devices with Combined Monte Carlo/quantum Approaches available in PDF, EPUB and Kindle.
On the Metrology of Nanoscale Silicon Transistors Above 100 GHz
On the Metrology of Nanoscale Silicon Transistors Above 100 GHz - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook On the Metrology of Nanoscale Silicon Transistors Above 100 GHz write by Kenneth Hoi Kan Yau. This book was released on 2011. On the Metrology of Nanoscale Silicon Transistors Above 100 GHz available in PDF, EPUB and Kindle. This thesis presents the theoretical and experimental framework for the development of accurate on-wafer S-parameter and noise parameter measurements of silicon devices in the upper millimetre-wave frequency range between 70 GHz and 300 GHz. Novel integrated noise parameter test setups were developed for nanoscale MOSFETs and SiGe HBTs and validated up to 170 GHz. In the absence of accurate foundry models in this frequency range, the experimental findings of this thesis have been employed by other graduate students to design the first noise and input impedance matched W- and D -band low-noise amplifiers in nanoscale CMOS and SiGe BiCMOS technologies. The results of the D-band S-parameter characterization techniques and of the new Y-parameter based noise model have been used by STMicroelectronics to optimize the SiGe HBT structure for applications in the D-band.Finally, to validate the proposed noise model, the first on-wafer integrated noise parameter measurement systems were designed and measured in the W- and D-bands. The systems enable millimetre-wave noise parameter measurements with the multi-impedance method by integrating the impedance tuner and an entire millimetre-wave noise receiver on the same die as the device-under-test. Good agreement was obtained between the noise parameters calculated from the Y-parameter measurements and those obtained from direct noise figure measurements with the integrated systems. The results indicate that the minimum noise figure of state-of-the-art advanced SiGe HBTs remains below 5 dB throughout the D-band, making them suitable for a variety of commercial products in this frequency range.In the first half of the thesis, theoretical analysis indicates that, for current silicon devices, distributive effects in test structure parasitics will become significant only beyond 300 GHz. This conclusion is supported by experiments which compare the lumped-element based open-short and the transmission line based split-thru de-embedding techniques to the multiline thru-reflect-line (TRL) network analyzer calibration algorithm.Electromagnetic simulations and measurements up to 170 GHz demonstrate that, for microstrip transmission lines with metal ground plane placed above the silicon substrate, the line capacitance per unit length remains a weak function of frequency. Based on this observation, the multiline TRL algorithm has been modified to include a dummy short de-embedding structure. This allowed for the first time to perform single step calibration and de-embedding of silicon devices using on-silicon calibration standards. The usefulness of the proposed method was demonstrated on the extraction of the difficult-to-measure SiGe HBT and nanoscale MOSFET model parameters, including transcondutance delay, tau, gate resistance, source resistance, drain-source capacitance, and channel resistance, Ri.Building on the small-signal characterization technique developed in the first half, a new Y-parameter based noise model for SiGe HBTs, that includes the correlation between the base and collector shot noise currents, is proposed in the second half of the thesis along with a method to extract the noise transit time parameter. With this model, the high frequency noise parameters of a SiGe HBT can be calculated from the measured Y-parameters, without requiring any noise figure measurements.
Noise in Nanoscale Semiconductor Devices
Noise in Nanoscale Semiconductor Devices - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Noise in Nanoscale Semiconductor Devices write by Tibor Grasser. This book was released on 2020-04-26. Noise in Nanoscale Semiconductor Devices available in PDF, EPUB and Kindle. This book summarizes the state-of-the-art, regarding noise in nanometer semiconductor devices. Readers will benefit from this leading-edge research, aimed at increasing reliability based on physical microscopic models. Authors discuss the most recent developments in the understanding of point defects, e.g. via ab initio calculations or intricate measurements, which have paved the way to more physics-based noise models which are applicable to a wider range of materials and features, e.g. III-V materials, 2D materials, and multi-state defects. Describes the state-of-the-art, regarding noise in nanometer semiconductor devices; Enables readers to design more reliable semiconductor devices; Offers the most up-to-date information on point defects, based on physical microscopic models.
Silicon-Based Nanomaterials
Silicon-Based Nanomaterials - read free eBook in online reader or directly download on the web page. Select files or add your book in reader. Download and read online ebook Silicon-Based Nanomaterials write by Robert W. Kelsall. This book was released on 2019-06-18. Silicon-Based Nanomaterials available in PDF, EPUB and Kindle. Silicon has been proven to be remarkably resilient as a commercial electronic material. The microelectronics industry has harnessed nanotechnology to continually push the performance limits of silicon devices and integrated circuits. Rather than shrinking its market share, silicon is displacing “competitor” semiconductors in domains such as high-frequency electronics and integrated photonics. There are strong business drivers underlying these trends; however, an important contribution is also being made by research groups worldwide, who are developing new configurations, designs, and applications of silicon-based nanoscale and nanostructured materials. This Special Issue features a selection of papers which illustrate recent advances in the preparation of chemically or physically engineered silicon-based nanostructures and their application in electronic, photonic, and mechanical systems.
